AES is used
to determine the atoms present at a surface, their concentrations, and their
lateral and depth distributions. Nano AES involves
its application to the analysis of very small regions of a surface, including nano-size particles. Sputter depth profiles of nano-thickness thin films will also be included.
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Introduction – surfaces, types of
surfaces.
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The principles of AES – production of
Auger electrons, peak labeling, handbooks, books, surface sensitivity,
information depth.
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Qualitative analysis – direct and
derivative spectra, identification of elements, energy resolution, chemical
effects, plasmons.
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Quantitative analysis – Auger intensities,
sensitivity factors, detection limit, matrix factors, backscattering, angle of
incidence and emission, diffraction.
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Instrumentation – field emission
electron source, spatial resolution (beam), signal-to-noise, beam damage,
cylindrical mirror analyzer (CMA), hemispherical type analyzer (HSA), pulse
counting.
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Imaging and
spatial resolution – scanning electron microscopy, acceptance area,
locating regions of interest, corrections for topography and backscattering,
beam energy, spatial resolution (analysis), comparison of analyzers, electron
energy loss (EELS) imaging, ratioed scatter diagrams,
line scans, image registration.
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Applications – nano analysis of spheres, particles, via holes, insulators,
sputter depth profiles of nanolayers.
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Summary – general summary.