XPS is used to determine
the atoms present at a surface and their concentrations, chemistry, and lateral
and depth distributions. This course emphasizes:
Day
1:
•
Introduction – terminology, surfaces, types of surfaces.
0.5 hour
•
The principles of XPS – production of photoelectrons, peak
labeling, electronic figuration of atoms, atoms, molecules, solids, energy,
spectra, Auger process, valence spectra, handbooks, books, surface sensitivity,
information depth, sample handling, spin-orbit splitting, chemical shift,
plasmons, multiplet splitting, shake-up. 3
hours
•
Instrumentation – dual anode, Bremsstrahlung, monochromatic
source, electron energy analyzers, spectrum acquisition, energy resolution,
scattering in analyzers, electron detectors, pulse counting, position sensitive
detectors, small area analysis, area location, imaging XPS, methods, equipment
and examples, vacuum system, samples, energy scale calibration. 3.5 hours
Day
2:
•
Qualitative analysis – identification of elements, changing
x-ray sources, charging, interpretation of chemical shift, relaxation effects,
Auger parameter, peak widths, lineshapes. 2
hours
•
Quantitative analysis – sensitivity factors, ionization cross
section, asymmetry parameter, analyzer transmission, reference spectra,
intensities, background subtraction, detection limit, effect of thin
overlayers. 2 hours
•
Artifacts –
x-ray damage, charging, methods for charge control, ghost peaks. 0.5 hour
•
Data acquisition and processing – processing data,
Tougaard background subtraction, satellite subtraction, peak area, lineshapes,
curve fitting, deconvolution. 1 hour
•
Depth profiling – non-destructive and destructive
methods, angle resolved XPS, diffraction, elastic scattering, thickogram,
inelastic loss method, sputtering, depth calibration. 2 hours
•
Applications – some further examples of applications of
XPS. 0.5 hours
•
Instrument selection and summary – factors to consider,
general summary. 0.2 hours